发明名称 W−Tiスパッタリングターゲット
摘要 This W-Ti sputtering target has a composition containing Ti in a range of 5% by mass to 20% by mass and Fe in a range of 25 ppm by mass to 100 ppm by mass, the remainder comprising W and unavoidable impurities, and satisfies the relational expression (Femax – Femin)/(Femax + Femin) ≤ 0.25, where Femax is the maximum value of the Fe concentration and Femin is the minimum value of the Fe concentration when the Fe concentration is measured in a plurality of locations in the plane of the target.
申请公布号 JP5999161(B2) 申请公布日期 2016.09.28
申请号 JP20140207343 申请日期 2014.10.08
申请人 三菱マテリアル株式会社 发明人 野中 荘平;齋藤 淳;大友 健志
分类号 C23C14/34;B22F5/00;C22C27/04 主分类号 C23C14/34
代理机构 代理人
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