| 摘要 |
According to an aspect of the present invention, provided are an evaporation source and a deposition apparatus having the same, wherein the evaporation source comprises: a nozzle unit having a transfer pipe, a diffusion pipe coupled to one end of the transfer pipe in a transverse direction to be interconnected to the transfer pipe, and a plurality of injection nozzles formed along a longitudinal direction of the diffusion pipe to protrude in all directions with respect to the transfer pipe; a container-shaped crucible coupled to the other end of the transfer pipe, wherein an evaporation material is accommodated; and a heat radiating plate having a heat radiating tube into which the injection nozzles are inserted to cover an outer circumference of the injection nozzles, and covering an upper portion of the diffusion pipe. |
