发明名称 |
ILLUMINATION SYSTEM FOR EUV PROJECTION LITHOGRAPHY |
摘要 |
An illumination system for EUV projection lithography has a beam shaping optical unit for generating an EUV collective output beam from an EUV raw beam of a synchrotron-radiation-based light source. An output coupling optical unit serves for generating a plurality of EUV individual output beams from the EUV collective output beam. In each case a beam guiding optical unit serves for guiding the respective EUV individual output beam toward an object field in which a lithography mask is arrangable. The result is an illumination system with which EUV light of a synchrotron-radiation-based light source is guided to the greatest possible extent without losses and at the same time flexibly. |
申请公布号 |
EP3072015(A1) |
申请公布日期 |
2016.09.28 |
申请号 |
EP20140802052 |
申请日期 |
2014.11.21 |
申请人 |
CARL ZEISS SMT GMBH |
发明人 |
PATRA, MICHAEL;MÜLLER, RALF |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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