HIGH VOLTAGE ISOLATION OF AN INDUCTIVELY COUPLED PLASMA ION SOURCE WITH A LIQUID THAT IS NOT ACTIVELY PUMPED
摘要
An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.
申请公布号
EP2724359(B1)
申请公布日期
2016.09.28
申请号
EP20120802095
申请日期
2012.06.21
申请人
FEI COMPANY
发明人
KELLOGG, SEAN;WELLS, ANDREW, B.;MCGINN, JAMES, B.;PARKER, N., WILLIAM;UTLAUT, MARK, W.