发明名称 ポリマー連結ナノ粒子を含有するフォトレジスト
摘要 Compositions such as photoresists and microfabrication processes are provided that can produce high-fidelity microfabricated structures. The provided photoresists can have reduced swelling during the development phase and can give tight tolerances for products, such as microneedles, that can be used, for example, in the medical field. The provided compositions include a photoresist, a photoinitiator system dispersed in the photoresist, and a polymer-tethered nanoparticle dispersed in the photoresist. The photoresist can be a negative photoresist and the photoinitiator system can include a two-photoinitiator system. The polymer-tethered nanoparticle can include an acrylic polymer and, in some embodiments, can include poly(methyl methacrylate). The nanoparticles can include silica.
申请公布号 JP5995963(B2) 申请公布日期 2016.09.21
申请号 JP20140514482 申请日期 2012.05.23
申请人 スリーエム イノベイティブ プロパティズ カンパニー 发明人 レディンジャー, デーヴィッド エイチ.;デヴォー, ロバート ジェイ.;エルドガン−ハウグ, ベルマ
分类号 G03F7/004;B29C33/38 主分类号 G03F7/004
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