| 摘要 |
The objective of the present invention is to provide a technique capable of restricting an installation area of a processing block, and at the same time, restricting lowering of an operation efficiency of an apparatus. A processing block is formed by: vertically dualizing a unit block for a front end process as a unit block for a first front end process and a unit block for a second front end process, and stacking the unit blocks; vertically dualizing a unit block for a rear end process as a unit block for a first rear end process and a unit block for a second rear end process, and stacking the unit blocks; and vertically dualizing a unit block for a development process as a unit block for a development frontend process and a unit block for a second development process, and stacking the unit blocks. A first transfer apparatus distributes and transfers substrates to each unit block for the rear end process from the unit blocks for the front end process. A second transfer apparatus distributes and transfers substrates completing exposure to the unit block for the development process. |
