发明名称 ウェーハ吸着装置およびウェーハ吸着方法
摘要 PROBLEM TO BE SOLVED: To easily bond a film to a chuck and cause the elastic film to suction a wafer without causing unevenness of adhesion strength.SOLUTION: A wafer suction device includes: a planar chuck (10) formed by a rigid material and generating a suction effect on its upper surface by vacuum; and an annular fixing member (52) having an inner diameter larger than an outer diameter of the chuck and fixing an elastic film having a number of suction holes to the inner side thereof. The annular member is moved down relative to the chuck, and the elastic film is stretched over the chuck with a uniform tensile force to be supported. The wafer is suctioned and held on the stretched elastic film.
申请公布号 JP5995497(B2) 申请公布日期 2016.09.21
申请号 JP20120091883 申请日期 2012.04.13
申请人 株式会社東京精密 发明人 金澤 雅喜;藤田 隆
分类号 H01L21/304;B24B41/06;H01L21/683 主分类号 H01L21/304
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