| 摘要 |
PROBLEM TO BE SOLVED: To prevent a substrate from falling from a substrate holder even when a trouble occurs in electrostatic attraction.SOLUTION: A vapor deposition device includes, in a vacuum chamber, a vapor deposition source that vaporizes a vapor deposition material, a substrate holder 2 that holds a substrate 7 in a manner of causing the same to face the vapor deposition source, and a vapor deposition mask having a plurality of openings arranged to correspond to a plurality of pattern forming areas preset on a surface of the substrate 7, and forms a thin film pattern by vapor-depositing the vaporized vapor deposition material from the vapor deposition source onto the substrate 7 via the plurality of openings of the vapor deposition mask. The substrate holder 2 includes an electrostatic chuck disposed in the central area of a holding face 2b for holding the substrate 7, and a magnetic chuck disposed on the holding face 2b to correspond at least to both edge areas of the substrate 7, and is constructed to hold the substrate 7 by statically attracting the substrate 7 and by magnetically attracting magnetic metal plates 10 separately formed and disposed on both the edge areas of the surface of the substrate 7. |
