发明名称 静電チャック、吸着方法及び吸着装置
摘要 PROBLEM TO BE SOLVED: To provide an electrostatic chuck capable of controlling adsorption power more preferably.SOLUTION: An electrostatic chuck 1 holding a wafer W on an upper surface thereof includes a substrate 3 made of a dielectric body, a first electrode 5 arranged inside the substrate 3, and a second electrode 7 formed on an upper surface of the substrate 3. The substrate 3 has a plurality of pins 3b protruding from the upper surface of the substrate 3, and a bottom surface located between the plurality of pins 3b on the upper surface. The second electrode 7 is formed on the bottom surface, and has a solid state portion entirely extending over an area surrounded by the plurality of pins 3 on the bottom surface.
申请公布号 JP5996276(B2) 申请公布日期 2016.09.21
申请号 JP20120124004 申请日期 2012.05.31
申请人 京セラ株式会社 发明人 宗石 猛
分类号 H01L21/683;H02N13/00 主分类号 H01L21/683
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