| 摘要 |
The purpose of the present invention is to treat the surfaces of multiple articles of interest with plasma uniformly. A holder (21) in which multiple substrates (11) are housed is set in a vacuum treatment chamber (14). First and second electrodes (41, 42) are arranged with being spaced apart from each other between the holder (21) and an inlet port (38). A process gas discharged through the inlet port (38) is excited with the first and second electrodes (41, 42) to generate plasma. The generated plasma is supplied to the inside of the holder (21) through a side opening provided on a side plate (22) of the holder (21), and removes contaminants on the surfaces of the substrates (11). |
