发明名称 GAS ADSORBING MATERIAL, PRECURSOR OF THE GAS ADSORBING MATERIAL, AND PROCESS FOR PRODUCING GAS ADSORBING MATERIAL
摘要 A gas adsorption material has a three-dimensional structure in which a ligand (p-hydroxybenzoic acid) consisting essentially of an aromatic ring as a principal skeleton containing, a carboxyl group and a functional group capable of forming a coordinate bond, the functional group being other than the carboxyl group, and a metal nucleus (Zn) are bonded to each other at a ratio of 1 : 1 in a building unit. In the gas adsorption material, the ligand contains a hydroxyl group as the functional group other than the carboxyl group, and the carboxyl group and the functional group other than the carboxyl group are each bonded in at least one position to the metal nucleus, thereby constituting the three-dimensional structure. The gas adsorption material is produced by drying a precursor that is obtained by reacting the ligand and the metal nucleus with each other, dissolving the dried precursor in an organic solvent (acetone), heating and stirring a resultant solution to form a three-dimensional structure that includes the organic solvent as a crystal solvent, and removing the crystal solvent.
申请公布号 EP2347821(B1) 申请公布日期 2016.09.21
申请号 EP20090815978 申请日期 2009.06.26
申请人 NGK INSULATORS, LTD. 发明人 FURUKAWA, MASAHIRO;GOTO, MASASHI
分类号 C07C65/03;C07F3/00 主分类号 C07C65/03
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