发明名称 REACTOR FOR PRODUCING POLYCRYSTALLINE SILICON, SYSTEM FOR PRODUCING POLYCRYSTALLINE SILICON, AND PROCESS FOR PRODUCING POLYCRYSTALLINE SILICON
摘要 An inner wall 11 of a reactor 10 has a two-layer structure: an anticorrosive layer 11a comprising an alloy material having high anticorrosiveness is provided on the inner side of the reactor contacting a corrosive process gas, and a heat conductive layer 11b for efficiently conducting the heat within the reactor 10 from an inner wall surface to a coolant flow passage 13 is provided on the outer side of the reactor (outer-wall side). The anticorrosive layer 11a comprises an alloy material having a composition for which a value R, defined by R = [Cr] + [Ni] - 1.5 [Si], is not less than 40% wherein[Cr]is a mass content (% by mass) of chromium (Cr), [Ni] is a mass content (% by mass) of nickel (Ni), and [Si] is a mass content (% by mass) of silicon (Si).
申请公布号 EP2479143(B1) 申请公布日期 2016.09.21
申请号 EP20100815095 申请日期 2010.07.09
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 NETSU, SHIGEYOSHI;OGURO, KYOJI;SHIMIZU, TAKAAKI;KUROSAWA, YASUSHI;KUME, FUMITAKA
分类号 C01B33/035 主分类号 C01B33/035
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