| 摘要 |
According to the present invention, provided is a technique capable of washing a substrate having a porous film on a surface layer while restricting damage. A substrate processing method to process a substrate (9) having a porous film (90), which has a porous structure, on a surface layer comprises the following processes: a) mixing a first processing liquid containing water with gas to form droplets of the first processing liquid, and spraying the droplets of the first processing liquid towards the porous film (90); and b) after the process a), mixing a second processing liquid, which is an organic solvent of a higher volatility than that of the first processing liquid, with gas to form droplets of the second processing liquid, and spraying the droplets of the second processing liquid towards the porous film (90). |
