| 摘要 |
PURPOSE: A laser processing apparatus is provided to efficiently heat the periphery of a portion in which a chemical vapor deposition (CVD) process is performed, and to reduce the deformation of a target which will be processed. CONSTITUTION: A laser processing apparatus includes a cooling air feeding unit (167) and a laser unit (163) irradiating a laser beam to a portion which will be processed. The cooling air feeding unit jets material gas and hot air to the periphery of the portion on a target to be processed. The cooling air feeding unit jets the cooling air to the periphery from the outside a position from which the material gas and the hot air are jetted. An exhaust outlet for sucking the material gas, the hot air, and the cooling air is installed between the position from which the material gas and the hot air are jetted and a position from which the cooling air is jetted. [Reference numerals] (101A) Fixing unit; (101B) Operating unit; (112) Glass loading board; (151) Processing unit; (152) Control unit; (161) Gas window; (162) Laser irradiation monitoring unit; (163) Laser unit; (164) Gas supply exhaust unit; (165) Air heater; (166) Air heater control unit; (167) Cooling air feeding unit |
