| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a master mold to be used for fabricating a replica mold having the design pattern data substantially similar to those of the master mold by nanoimprint lithography and to provide another method for producing the replica mold by utilizing the method for producing the master mold.SOLUTION: When a tentative replica mold is fabricated by the nanoimprint lithography on the basis of a tentative master mold to be fabricated on the basis of the tentative master pattern data to be created from the design pattern data of the replica mold, the method for producing the master mold comprises the steps of: calculating a positional shift ratio of a fine rugged pattern from a formation-planned position thereof; correcting the position of the fine rugged pattern in the tentative master pattern data on the basis of a correction ratio to be calculated by using the positional shift ratio to create the corrected master pattern data; and producing the master mold on the basis of the corrected master pattern data. |
