发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a fine transistor.SOLUTION: A semiconductor device comprises: a first insulator on a substrate; a second insulator on the first insulator; a semiconductor on the second insulator; a first conductor and a second conductor on the semiconductor; a third insulator on the semiconductor; a fourth insulator on the third insulator; a third conductor on the fourth insulator; and a fifth insulator on the first insulator, the first conductor and the second conductor. The semiconductor has a first region, a second region, and a third region. The first region has a region overlapped with the third conductor via the third insulator and the fourth insulator. The second region has a region overlapped with the third conductor via the first conductor, the fourth insulator and the fifth insulator. The third region has a region overlapped with the third conductor via the second conductor, the fourth insulator and the fifth insulator. The fourth insulator has a region contacted with a lateral face of the fifth insulator, in a region superposed with the semiconductor.SELECTED DRAWING: Figure 1
申请公布号 JP2016167595(A) 申请公布日期 2016.09.15
申请号 JP20160040027 申请日期 2016.03.02
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI
分类号 H01L21/336;G09F9/00;G09F9/30;H01L21/8234;H01L21/8242;H01L27/088;H01L27/10;H01L27/108;H01L29/786 主分类号 H01L21/336
代理机构 代理人
主权项
地址