发明名称 EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
摘要 During the drive of a stage (WST), positional information in a movement plane of the stage (WST) is measured by three encoders (Enc1, Enc2, and Enc3) that include at least one each of an X encoder and a Y encoder of an encoder system, and a controller switches the encoders used for a measurement of positional information of the stage (WST) in the movement plane from the encoders (Enc1, Enc2, and Enc3) to encoders (Enc4, Enc2, and Enc3) so that the position of the stage (WST) in the movement plane is maintained before and after the switching. Therefore, although the switching of the encoders used for controlling the position of the stage is performed, the position of the stage in the movement plane is maintained before and after the switching, and a correct linkage becomes possible.
申请公布号 EP3067748(A1) 申请公布日期 2016.09.14
申请号 EP20160164422 申请日期 2007.08.31
申请人 NIKON CORPORATION 发明人 SHIBAZAKI, YUICHI
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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