发明名称 |
ミクロ構造の非対称性を測定する方法および装置、位置測定方法、位置測定装置、リソグラフィ装置およびデバイス製造方法 |
摘要 |
A lithographic apparatus includes a sensor, such as an alignment sensor including a self-referencing interferometer, configured to determine the position of an alignment target including a periodic structure. An illumination optical system focuses radiation of different colors and polarizations into a spot which scans the structure. Multiple position-dependent signals are detected and processed to obtain multiple candidate position measurements. Asymmetry of the structure is calculated by comparing the multiple position-dependent signals. The asymmetry measurement is used to improve accuracy of the position read by the sensor. Additional information on asymmetry may be obtained by an asymmetry sensor receiving a share of positive and negative orders of radiation diffracted by the periodic structure to produce a measurement of asymmetry in the periodic structure. |
申请公布号 |
JP5992110(B2) |
申请公布日期 |
2016.09.14 |
申请号 |
JP20150540149 |
申请日期 |
2013.11.04 |
申请人 |
エーエスエムエル ネザーランズ ビー.ブイ. |
发明人 |
ティネマンズ,パトリシウス;デン ボーフ,アリー,ジェフリー;マタイセン,サイモン,ガイスベルト,ヨセフス |
分类号 |
G03F9/00;G01B11/00;G03F7/20 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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