发明名称 モールド製造方法、モールド製造装置及びパターン形成方法
摘要 According to one embodiment, a mold manufacturing method includes obtaining a first distribution, obtaining a second distribution, generating a correction data, and forming a second mold. The first distribution is a distribution of level difference included in a first layer on a substrate. The obtaining the second distribution obtains the second distribution when a first mold having the concave-convex pattern is brought into contact with a photosensitive resin applied on the first layer and the resin is cured. The second distribution is a distribution of film thickness of the resin remaining between the substrate and a convex pattern feature of a concave-convex pattern. The correction data is a data for suppressing a difference between one of the first distribution and the second distribution, and a film thickness of a reference set beforehand. The second mold is different from the first mold using the correction data.
申请公布号 JP5992377(B2) 申请公布日期 2016.09.14
申请号 JP20130168916 申请日期 2013.08.15
申请人 株式会社東芝 发明人 小林 幸子;田中 聡;高畑 和宏
分类号 H01L21/027;B29C33/38;B29C59/02 主分类号 H01L21/027
代理机构 代理人
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