发明名称 シリコン単結晶製造装置からのアルゴンガス回収精製方法及びアルゴンガス回収精製装置
摘要 An argon gas recovering and purifying method including: introducing waste argon gas containing nitrogen, oxygen, and carbon monoxide from silicon single crystal manufacturing apparatus into waste argon gas storage tank; removing solid matters in pretreatment facility which removes the solid matters in waste argon gas; converting oxygen into water and converting carbon monoxide into carbon dioxide by catalytic reaction; removing the water, the carbon dioxide, and the nitrogen to obtain recovered gas, in the argon gas recovering and purifying method and an argon gas recovering and purifying apparatus, the catalytic reaction is carried out with compression heat alone by arranging a catalyst in a two-stage compressor, and the water is removed by a dryer in advance and then the nitrogen and the carbon dioxide are adsorbed and removed in an ordinary-temperature adsorption tower at the step of obtaining the recovered gas.
申请公布号 JP5991330(B2) 申请公布日期 2016.09.14
申请号 JP20140014391 申请日期 2014.01.29
申请人 信越半導体株式会社 发明人 松嶋 秀明;小野沢 一郎;矢島 渉
分类号 C01B23/00;B01D53/047;B01D53/28 主分类号 C01B23/00
代理机构 代理人
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