| 摘要 |
PROBLEM TO BE SOLVED: To efficiently obtain a seamless mold for transferring a fine structure by discriminating a substrate that causes exposure failure prior to exposure development.SOLUTION: The method for manufacturing a seamless mold for transferring a fine structure comprises: evaluating a surface of a substrate that is a long body by irradiating the substrate with a first laser beam; forming a resist layer of a thermo-reactive resist or a photo-reactive resist on a substrate that is determined as a non-defective product by the above-mentioned evaluation; and irradiating the resist layer with a second laser beam to form a fine mold pattern. |
