System for exposure of a substrate with several individually shaped charged particle beams for high resolution lithography of structured patterns

摘要

The arrangement has multiple individually formed controllable particle beams (118) with a particle beam source (1) for emitting a particle beam (11), an illuminating system (2) for forming and deflection of the particle beam for illuminating an aperture blind array. The multi blind arrays are formed with different beam cross-sections as multi-format blind array (41,42) for generation of particle partial beam. Three multi-beam deflector arrays (51,52,53) are assigned to the individual deviation of the particle partial beam.