A NOVEL ORGANOMETALLIC COMPOUNDS CONTAINING ZIRCONIUM METAL AND THE PREPARATION THEREOF, AND METHOD FOR MANUFACTURING THIN FILM USING THE NOVEL ORGANOMETALLIC COMPOUNDS

摘要

The present invention relates to a novel organometallic compound represented by the following chemical formula 1 and a method for preparing the same and, more specifically, to an organometallic compound of zirconium, which is applicable for chemical vapor deposition (CVD) or atomic layer deposition (ALD) and stable thermally and chemically, a method for preparing the same, and a method for manufacturing a thin film using the same. The organometallic compound of zirconium prepared by the present invention has high volatility and thermal stability, thereby being advantageously used for manufacturing a thin film of zirconium oxide. (Chemical formula 1) In the chemical formula 1, R1 represents alkyl groups having 1 to 4 carbon atoms, R2 and R3 represent alkyl groups having 1 to 6 carbon atoms independently of each other.