| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition forming a transparent cured product excellent in scratch resistance.SOLUTION: A photosensitive composition includes (1) a radical initiator (A), (2) an acid generator (B) and/or a base generator (C), and (3) a polymerizable substance (D), wherein at least one of the radical initiator (A), the acid generator (B) and the base generator (C) generates an active species (H) by being irradiated with active light, the active species (H) reacts with the radical initiator (A), the acid generator (B) or the base generator (C) to create a new species (I), and the polymerizable substance (D) is caused to undergo polymerization by the new active species (I). The active species (H) or (I) are an acid or a base, and none of coloring agent, metal oxide powder and metallic powder is substantially contained in the composition. |
