发明名称 基板貫通相互接続を有する半導体構成と、基板貫通相互接続を形成する方法
摘要 Some embodiments include methods of forming interconnects through semiconductor substrates. An opening may be formed to extend partway through a semiconductor substrate, and part of an interconnect may be formed within the opening. Another opening may be formed to extend from a second side of the substrate to the first part of the interconnect, and another part of the interconnect may be formed within such opening. Some embodiments include semiconductor constructions having a first part of a through-substrate interconnect extending partially through a semiconductor substrate from a first side of the substrate; and having a second part of the through-substrate interconnect extending from a second side of the substrate and having multiple separate electrically conductive fingers that all extend to the first part of the interconnect.
申请公布号 JP5989104(B2) 申请公布日期 2016.09.07
申请号 JP20140514461 申请日期 2012.05.03
申请人 マイクロン テクノロジー, インク. 发明人 ウッド,アラン ジー.;アイルランド,フィリップ ジェイ.
分类号 H01L21/3205;H01L21/768;H01L23/12;H01L23/522 主分类号 H01L21/3205
代理机构 代理人
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