发明名称 薬液供給システム
摘要 PROBLEM TO BE SOLVED: To provide a technology for measuring a flow rate of a diaphragm pump.SOLUTION: A chemical supply system is provided which calculates at least one of a suction amount and a discharge amount of a chemical on the basis of a flow rate of working gas. The chemical supply system comprises: a pump 13 including a pump body with which an internal space communicating to a chemical suction port 21b and a chemical discharge port 21c is formed, and a diaphragm for partition into a pump chamber at a side communicating to the chemical suction port and the chemical discharge port and an operation chamber at a side communicating to a working gas supply port; a pump drive part 59 for supplying the working gas to the working gas supply port; a control part for sucking and discharging the chemical by operating the chemical suction port, the chemical discharge port and the pump drive part; and a gas flow rate measuring part for measuring the flow rate of the working gas.
申请公布号 JP5989881(B2) 申请公布日期 2016.09.07
申请号 JP20150189619 申请日期 2015.09.28
申请人 CKD株式会社 发明人 坂井 厚之;吉田 匡輝;豊田 哲也
分类号 F04B9/123;F04B43/06 主分类号 F04B9/123
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