| 摘要 |
PROBLEM TO BE SOLVED: To easily hold a substrate without providing a driving mechanism which drives a substrate holding part.SOLUTION: A substrate processing apparatus includes: a substrate holding part 2; a substrate rotation mechanism; and a chamber. The substrate rotation mechanism includes: an annular rotor part 52 which is disposed in an internal space of the chamber; and a stator part disposed around the rotor part 52 outside the chamber. The substrate holding part 2 is attached to the rotor part 52. In the substrate holding part 2, each substrate support part supports a substrate 9 from the lower side. Each substrate pressing part 23 is rotated from a second standby position to a second holding position by a centrifugal force of the rotation by the substrate rotation mechanism to press the substrate 9 from the upper side at a second substrate contact part 233. As just described, the substrate holding part 2 easily holds the substrate 9 in the sealed internal space of the chamber without providing a driving mechanism which is mechanically connected with the substrate support part and the substrate pressing parts 23 and drives the substrate support part and the substrate pressing parts 23. |
