METHOD OF FORMING PATTERN BY USING BLOCK COPOLYMER

摘要

The present invention provides a method of forming a pattern using a block copolymer. The method of forming a pattern using a block copolymer forms a guide pattern for providing first openings to be filled with a block copolymer on an under layer and a first peripheral pattern for providing second openings into which a portion of the block copolymer is to flow, introduces and anneals a layer of the block copolymer to induce a shielding unit for sealing the second openings with components of the copolymer remaining in the second openings, induces formation of first domain units and second domain units in the first openings, then selectively removes the first domain units to induce third openings, and induces fourth openings extended from the third openings to penetrate the under layer.