| 摘要 |
The present invention relates to a contactless processing device using a beam with a heat radiation structure, capable of improving accuracy for processing by preventing overheating in a vacuum chamber by preventing the beam from being directly radiated to a component except for a processed article. The contactless processing device comprises: the vacuum chamber providing a vacuum pressure inside; a beam radiator radiating the beam to a lower part by being installed in the vacuum chamber; a fixture fixating the processed article on a surface, and installed in the lower part of a beam radiator; a Y-axis stage installed to move in a Y-axis while supporting the fixture in the lower part of the fixture, wherein the Y-axis stage moves in the Y-axis with the fixture; an X-axis stage connected to the Y-axis stage to move in the Y-axis while being installed in the lower part of the Y-axis stage wherein the X-axis stage is connected to the vacuum chamber to move in an X-axis direction, and moves with the Y-axis stage in the X-axis direction; a transfer unit providing a moving force to the Y-axis stage and the X-axis stage respectively; and an overheating prevention unit cooling a bottom surface while guiding the beam of the beam radiator to the bottom surface of the vacuum chamber without directly radiating the beam to the X-axis stage or the Y-axis stage, and preventing overheating in the vacuum chamber. |
