PHOTOMASK, PHOTOMASK SET, METHOD FOR MANUFACTURING PHOTOMASK, AND METHOD FOR MANUFACTURING DISPLAY APPARATUS

摘要

Provided are a photomask manufactured at a high yield and in a stable manner by a display apparatus which is finely divided and has high integration and a method for manufacturing the photomask. The photomask has a transfer pattern obtained with a semi-transparent film and a light-shielding film respectively patterned, wherein the semi-transparent film and the light-shielding film are formed on a transparent subtract. The transfer pattern comprises: a transparent unit; a light-shielding unit; a semi-transparent unit; and a semi-transparent rim unit. The transparent unit is adjacent with a width W(m) of the semi-transparent rim unit, and the same is adjacent with the light-shielding unit, wherein the width of the semi-transparent rim unit is in the range of 0