发明名称 CMP後の洗浄ブラシ
摘要 Embodiments of the invention include a CMP brush that has a combination of central nodules at an inner region of the brush and one or more edge nodules at an end region of the brush where the central nodules and edge nodules are in a staggered or matched arrangement with each other and an upper surface of each edge nodule on the brush has the same or a greater contact area than an upper surface of a central nodule. The area of contact of the upper surface of each edge nodule with the substrate edge region is the same or greater than the area of contact of the upper surface of a central nodule with the substrate center region.
申请公布号 JP5977175(B2) 申请公布日期 2016.08.24
申请号 JP20120554082 申请日期 2011.02.21
申请人 インテグリス・インコーポレーテッド 发明人 ワーゴ、クリストファー;シン、ラケシュ;トリオ、デイビッド;マクナマラ、エリック
分类号 H01L21/304 主分类号 H01L21/304
代理机构 代理人
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