发明名称 マルチ荷電粒子ビーム描画装置
摘要 A multi charged particle beam writing apparatus of the present invention includes an aperture member to form multiple beams, a plurality of first deflectors to respectively perform blanking deflection of a corresponding beam, a second deflector to collectively deflect the multiple beams having passed through the plurality of openings of the aperture member so that the multiple beams do not reach the target object, a blanking aperture member to block each beam that has been deflected to be in the off state by the plurality of first deflectors, and a current detector, arranged at the blanking aperture member, to detect a current value of all beams in the on state in the multiple beams that have been deflected by the second deflector.
申请公布号 JP5977550(B2) 申请公布日期 2016.08.24
申请号 JP20120065386 申请日期 2012.03.22
申请人 株式会社ニューフレアテクノロジー 发明人 松本 裕史
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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