发明名称 偏光光照射装置
摘要 PROBLEM TO BE SOLVED: To provide a polarized light irradiation apparatus that has a shutter mechanism and can suppress an increase in temperature of the shutter mechanism and prevent a reduction in polarization performance.SOLUTION: A polarized light irradiation apparatus 100 includes: a light irradiation part 10 that irradiates an alignment film with polarized light in which light from a light source is polarized by a polarizer; and a shutter member (shutter member 31) that is arranged on the light-emission side of a light emission port 14a of the light irradiation part 10, and can move between a shielding position to shield the polarization light emitted from the light irradiation part 10 and a retreat position to retreat from the shielding position to allow the irradiation of the alignment film with the polarized light. The retreat position is a position at which the alignment film is not irradiated with the polarized light emitted from the light irradiation part 10.
申请公布号 JP5979179(B2) 申请公布日期 2016.08.24
申请号 JP20140120451 申请日期 2014.06.11
申请人 ウシオ電機株式会社 发明人 吉原 啓太
分类号 G02F1/1337;G02F1/13;G03F7/20 主分类号 G02F1/1337
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