BARRIER SEAL FOR ELECTROSTATIC CHUCK

摘要

The present invention provides a barrier seal for an electrostatic chuck under a plasma etching process. The barrier seal includes a number of sealing parts to block a connection layer of the electrostatic chuck from a plasma gas. A groove of the electrostatic chuck can be filled with a barrier seal completely. Even though one of the sealing parts is broken by the plasma gas during plasma etching, the barrier seal can prevent leakage of the electrostatic chuck effectively. The barrier seal provides a buffer cycle for an engineer to replace the broken barrier seal before the leakage occurs. Leakage risk due to abrupt destruction of the barrier seal is reduced. Furthermore, the barrier seal makes stability and safety of the plasma etching process easy. Profit of a product manufactured by the electrostatic chuck can be improved.