| 发明名称 |
LIQUID COMPOSITION, METHOD OF PRODUCING SILICON SUBSTRATE, AND METHOD OF PRODUCING LIQUID DISCHARGE HEAD SUBSTRATE |
| 摘要 |
A liquid composition used to carry out crystal anisotropic etching of a silicon substrate provided with an etching mask formed of a silicon oxide film with the silicon oxide film used as a mask includes cesium hydroxide, an alkaline organic compound, and water. |
| 申请公布号 |
EP2355138(B1) |
申请公布日期 |
2016.08.24 |
| 申请号 |
EP20110000205 |
申请日期 |
2011.01.12 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
ABO, HIROYUKI;YONEMOTO, TAICHI;KOYAMA, SHUJI;FURUSAWA, KENTA;KISHIMOTO, KEISUKE |
| 分类号 |
B41J2/16;C09K13/02;H01L21/306 |
主分类号 |
B41J2/16 |
| 代理机构 |
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