发明名称 SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 A semiconductor device has a p-type metal oxide semiconductor layer; a source electrode connected with the p-type metal oxide semiconductor layer; a drain electrode connected with the p-type metal oxide semiconductor layer; and a gate electrode arranged to oppose to a part of the p-type metal oxide semiconductor layer. The gate electrode and the drain electrode are separated from each other in a top view.
申请公布号 US2016240564(A1) 申请公布日期 2016.08.18
申请号 US201615139782 申请日期 2016.04.27
申请人 Renesas Electronics Corporation 发明人 SUNAMURA Hiroshi;KANEKO Kishou;FURUTAKE Naoya;SAITOU Shinobu;HAYASHI Yoshihiro
分类号 H01L27/12;H01L29/786;H01L29/423;H01L29/66;H01L21/477;H01L29/24;H01L27/092 主分类号 H01L27/12
代理机构 代理人
主权项
地址 Tokyo JP