发明名称 |
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME |
摘要 |
An object is to provide a display device with high productivity by reducing the number of masks and the number of steps. Another object is to provide a display device with high yield. A pixel transistor and a driver transistor are formed over a substrate having an insulating surface in the same step. A pixel electrode electrically connected to the pixel transistor is one electrode. The other electrode is supplied with a fixed potential. A region where a pair of electrodes overlap with each other is used as a capacitor. Accordingly, the number of masks and steps are reduced to provide a display device with high productivity. |
申请公布号 |
US2016240562(A1) |
申请公布日期 |
2016.08.18 |
申请号 |
US201615041356 |
申请日期 |
2016.02.11 |
申请人 |
Semiconductor Energy Laboratory Co., Ltd. |
发明人 |
MIYAKE Hiroyuki;KUSUNOKI Koji |
分类号 |
H01L27/12;H01L29/24;G02F1/1333;G02F1/1343;G02F1/1345;H01L29/786;G02F1/1368 |
主分类号 |
H01L27/12 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device comprising:
a first transistor comprising a gate electrode over a substrate; a first electrode electrically connected to the first transistor; a second transistor comprising a first gate electrode over the substrate; a second electrode overlapping with the first gate electrode of the second transistor; and a third electrode over the substrate, the third electrode being supplied with a fixed potential, wherein the second electrode and the third electrode are formed from a same film comprising a light-transmitting material, and wherein a capacitor is formed in a region where the first electrode and the third electrode overlap with each other with an insulating film provided therebetween. |
地址 |
Atsugi-shi JP |