| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad in which a function for storing and discharging slurry is exhibited in each bubble substantially equally, and thereby occurrence of polishing unevenness can be prevented, and to provide a method for forming the same.SOLUTION: A polishing pad 1 is formed of multiple elongated bubbles 10 extending toward a polished surface from the surface to be supported in an inside of an elastic resin sheet 2. Each of the bubbles 10 has a slanted part 12 formed to be slanted to the polished surface in a vicinity of the polished surface. When the elastic resin sheet 2 is viewed along a direction perpendicular to the polished surface, and an angle formed by a direction AR1 to which the slanted part 12 extends and by a circumferential direction AR2 of the elastic resin sheet 2 in a position of the slanted part 12 is assumed to be a first angle, all bubbles 10 are formed such that each of the first angle becomes substantially identical to each other. |
