发明名称 塩、レジスト組成物及びレジストパターンの製造方法
摘要 A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, Ll represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or carbonyl group, provided that Ll is not a single bond when n is 0, ring W represents a C3-C36 aliphatic ring in which a methylene group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom may be replaced by a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, Rl represents a hydroxyl group or a hydroxyl group protected by a protecting group, and Z+ represents an organic cation.
申请公布号 JP5970926(B2) 申请公布日期 2016.08.17
申请号 JP20120086143 申请日期 2012.04.05
申请人 住友化学株式会社 发明人 安立 由香子;市川 幸司
分类号 C07C309/17;C07C381/12;C08F220/38;C09K3/00;G03F7/004;G03F7/039;H01L21/027 主分类号 C07C309/17
代理机构 代理人
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