发明名称 多結晶シリコンの粒径評価方法および多結晶シリコン棒の選択方法
摘要 PROBLEM TO BE SOLVED: To provide a technique which contributes the stable production of a single crystal silicon by selecting a polycrystal silicon suitable for a production raw material for the single crystal silicon in high quantitativity and reproducibility.SOLUTION: When evaluating a grain size of a polycrystal silicon by an X-ray diffraction method, a value (&Dgr;B/P) is used as an evaluation index of the grain size of the polycrystal silicon by the steps of: placing a sampled tabular specimen 20 at a position where Bragg reflection from a Miller index plane <hkl> is detected; rotating the tabular specimen 20 in a plane around the center of the tabular specimen 20 as a rotation center by a rotation angle of &phgr; so that an X-ray irradiation region defined by a slit &phgr;-scans on a principal surface of the tabular specimen 20; obtaining a chart indicating rotation angle (&phgr;) dependency of a Bragg reflection intensity of the tabular specimen 20 from the Miller index plane <hkl>; obtaining a difference (&Dgr;B) between a maximum value (B) and a minimum value (B) of a diffraction intensity value of a base line from the chart; and dividing &Dgr;B by a mean value (P) of the diffraction intensity values.
申请公布号 JP5969956(B2) 申请公布日期 2016.08.17
申请号 JP20130130789 申请日期 2013.06.21
申请人 信越化学工業株式会社 发明人 宮尾 秀一;祢津 茂義
分类号 C01B33/02;C30B29/06 主分类号 C01B33/02
代理机构 代理人
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