APPARATUS AND METHOD FOR PREVENTING MARKING POSITION CHANGE OF WAFER IN WAFER MARKING PROCESS USING LASER, AND WAFER MARKING APPARATUS AND METHOD USING LASER

摘要

Disclosed are an apparatus and method for preventing marking position change of a wafer in a wafer marking process using laser, and a wafer marking apparatus and method using laser. The apparatus for preventing marking position change of a wafer comprises: a wafer holder including a holder insert portion on which the wafer is seated, and having a target pattern having a certain shape; a stage installed to be movable in first and second directions around the wafer holder; and a camera mounted on the stage to measure the location of the wafer and the location of the target pattern.