SUBSTRATE PROCESSING APPARATUS, GAS RECTIFYING PART, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

摘要

A substrate processing apparatus prevents process uniformity from being deteriorated due to the non-uniformity of the temperature distribution of a substrate. The substrate processing apparatus comprises a process chamber for processing a substrate; a substrate mounting unit which is installed in the process chamber, and on which the substrate is mounted; a heating part which heats the substrate; a gas rectifying part which supplies a process gas to the substrate; a seal part which is installed in the gas rectifying part; an insulation part which is installed between the seal part and the upper surface of the gas rectifying part; and a first pressure control part which is connected to the insulation part.