发明名称 磁性薄膜形成用スパッタリングターゲット
摘要 This sintered-body sputtering target has, as main components thereof, an Fe-Pt alloy and a non-magnetic material, and is characterized by: including at least 50 but not more than 5000 ppm by mass of an element which forms an oxide having a lower standard free energy of formation of an oxide per 1 mol of oxygen than CO (carbon monoxide); and including, as the non-magnetic material, at least one from among carbon, a carbide, and a nitride. The present invention addresses the problem of providing a sputtering target which comprises an Fe-Pt alloy and a non-magnetic material, and with which the amount of particles generated during sputtering is significantly reduced.
申请公布号 JP5969120(B2) 申请公布日期 2016.08.17
申请号 JP20150517022 申请日期 2014.04.30
申请人 JX金属株式会社 发明人 佐藤 敦
分类号 C23C14/34;C22C5/04;C22C30/00 主分类号 C23C14/34
代理机构 代理人
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