| 摘要 |
An end-point detecting device according to the present technology includes: a filter unit divided into multiple transmission regions and selectively transmitting multiple plasma beams generated when plasma-processing in a process chamber per region; a photoelectric conversion unit including a sensor unit sensing the intensity of the multiple plasma beams transmitted through the filter unit, an amplification unit amplifying signals outputted by the sensor unit after sensing the intensity of the plasma beams, and an A/D converter unit converting the signals transmitted from the amplification unit into electronic signals; an end-point detecting unit receiving the electronic signals of the multiple plasma beams from the photoelectric conversion unit, outputting light intensity graphs of each plasma beam, and detecting an end point for plasma-processing generating the plasma beams based on the graphs; and a screen unit reducing the light amount of the multiple plasma beams to be transmitted through each region of the filter unit by adjusting areas of each transmission region of the filter unit. The photoelectric conversion unit and the screen unit can be operated to increase or decrease the intensity of the multiple plasma beams if the intensity of the multiple plasma beams is out of a measurement range of the end-point detecting unit. The purpose of the present invention is to provide the end-point detecting device capable of easily detecting the intensity of the multiple plasma beams with different wavelengths. |
