| 摘要 |
A measurement apparatus 10 comprising a base 13 for receiving an object to be measured, a pattern 17 on the base that is visually different in different locations, an abutment element 12 moveable relative to the object and the pattern, the moveable abutment element being configured to partially cover the pattern from an imaging apparatus and provide at least one datum point for the imaging apparatus for determining measurement data for the object based on the at least one datum point and a part of the pattern remaining visible for the imaging apparatus. The datum point may comprise an edge of an opening in the abutment element. The pattern may comprise a picture, or a random array of subpatterns. There may be a second pattern for use in focussing the imaging apparatus. The base and abutment element may have a teething structure (figure 4a) for alignment. Methods, imaging apparatuses and a system for generating and processing measurement data are also disclosed. |
