发明名称 コロイドシリカの製造方法及びCMP用スラリーの製造方法
摘要 PROBLEM TO BE SOLVED: To provide a method for producing colloidal silica which has a high degree of purity as far as possible at a low cost as far as possible.SOLUTION: A method for producing colloidal silica is characterized by including a silicon particle producing step (silicon wafer processing step) of obtaining silicon particles by cutting a silicon ingot into a plurality of thin sheets by using a wire saw, and a colloidal silica forming step of forming colloidal silica by mixing a basic material, the silicon particles and water.
申请公布号 JP5972660(B2) 申请公布日期 2016.08.17
申请号 JP20120111020 申请日期 2012.05.14
申请人 株式会社アドマテックス 发明人 楊原 武;山田 美幸
分类号 C01B33/14;B24B37/00;C09K3/14;H01L21/304 主分类号 C01B33/14
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