| 摘要 |
The invention provides a photomask manufacturing method, a photomask inspection method, a photomask inspection apparatus, and a drawing device, which are capable of improving the coordinate precision of a pattern formed on a transferred body. The photomask manufacturing method according to the invention comprises the steps of: preparing pattern design data (A); obtaining transferred face correction data (D) representing the deformation of a main surface due to the maintaining of a photomask to an exposure apparatus and the deformation other than the dead weight deflection component; obtaining height distribution data (E) in the drawing which represent the height distribution of the main surface under such a state that the photomask green body is loaded to a work table of the drawing device; obtaining drawing differential data through the difference between the height distribution data (E) in the drawing and the transferred face correction data (D); calculating a coordinate deviation value corresponding to the drawing differential data (F), and determining coordinate deviation value data (G) for drawing; and using the coordinate deviation value data (G) for drawing and the pattern design data (A) for a drawing process on the photomask green body. |
