| 摘要 |
PROBLEM TO BE SOLVED: To obtain a method of manufacturing a metal mask, in which a resist height can be made 0.1-2 μm by making a mold using electrodeposition resist.SOLUTION: A method of manufacturing a metal mask includes steps of: putting a base material in an electrodeposition tank that accommodates electrodeposition resist, and forming an ultrathin film of electrodeposition resist having a thickness of 0.1-2 μm on a surface of the base material; exposing and developing the base material on which the electrodeposition resist is coated, and leaving the ultrathin film of electrodeposition resist having the thickness of 0.1-2 μm in a part corresponding to an opening pattern of the metal mask on the base material surface; a product plating process for forming an opening having a rounded cross-section on a plating growth face side by electroplating on the base material and the electrodeposition resist by over electroforming, and forming a small difference to the base material face side of the opening; and obtaining the metal mask by peeling off the electrodeposition resist and peeling off from the base material. |
