发明名称 METHOD FOR GROWING -Ga2O3-BASED SINGLE CRYSTAL FILM, AND CRYSTALLINE LAYERED STRUCTURE
摘要 Provided are: a method for efficiently growing a high-quality, large diameter ²-Ga 2 O 3 -based single crystal film; and a crystalline layered structure having a ²-Ga 2 O 3 -based single crystal film grown using this growing method. As one embodiment, the present invention provides a method for growing a ²-Ga 2 O 3 -based single crystal film by using the HVPE method, and including a step for exposing a Ga 2 O 3 -based substrate (10) to a gallium chloride gas and an oxygen-containing gas, and growing a ²-Ga 2 O 3 -based single crystal film (12) on the principal surface (11) of the Ga 2 O 3 -based substrate (10) at a growing temperature of 900° C or higher.
申请公布号 EP3054037(A1) 申请公布日期 2016.08.10
申请号 EP20140849461 申请日期 2014.09.18
申请人 TAMURA CORPORATION;NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY 发明人 GOTO, KEN;SASAKI, KOHEI;KOUKITU, AKINORI;KUMAGAI, YOSHINAO;MURAKAMI, HISASHI
分类号 C30B29/16;C23C16/40;C23C16/448;C30B25/14;H01L21/365 主分类号 C30B29/16
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