发明名称 |
METHOD FOR GROWING -Ga2O3-BASED SINGLE CRYSTAL FILM, AND CRYSTALLINE LAYERED STRUCTURE |
摘要 |
Provided are: a method for efficiently growing a high-quality, large diameter ²-Ga 2 O 3 -based single crystal film; and a crystalline layered structure having a ²-Ga 2 O 3 -based single crystal film grown using this growing method. As one embodiment, the present invention provides a method for growing a ²-Ga 2 O 3 -based single crystal film by using the HVPE method, and including a step for exposing a Ga 2 O 3 -based substrate (10) to a gallium chloride gas and an oxygen-containing gas, and growing a ²-Ga 2 O 3 -based single crystal film (12) on the principal surface (11) of the Ga 2 O 3 -based substrate (10) at a growing temperature of 900° C or higher. |
申请公布号 |
EP3054037(A1) |
申请公布日期 |
2016.08.10 |
申请号 |
EP20140849461 |
申请日期 |
2014.09.18 |
申请人 |
TAMURA CORPORATION;NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY |
发明人 |
GOTO, KEN;SASAKI, KOHEI;KOUKITU, AKINORI;KUMAGAI, YOSHINAO;MURAKAMI, HISASHI |
分类号 |
C30B29/16;C23C16/40;C23C16/448;C30B25/14;H01L21/365 |
主分类号 |
C30B29/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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