发明名称 半導体装置の作製方法
摘要 An object is to increase an aperture ratio of a semiconductor device. The semiconductor device includes a driver circuit portion and a display portion (also referred to as a pixel portion) over one substrate. The driver circuit portion includes a channel-etched thin film transistor for a driver circuit, in which a source electrode and a drain electrode are formed using metal and a channel layer is formed of an oxide semiconductor, and a driver circuit wiring formed using metal. The display portion includes a channel protection thin film transistor for a pixel, in which a source electrode layer and a drain electrode layer are formed using an oxide conductor and a semiconductor layer is formed of an oxide semiconductor, and a display portion wiring formed using an oxide conductor.
申请公布号 JP5969079(B2) 申请公布日期 2016.08.10
申请号 JP20150057142 申请日期 2015.03.20
申请人 株式会社半導体エネルギー研究所 发明人 山崎 舜平;坂田 淳一郎;三宅 博之;桑原 秀明;川俣 郁子
分类号 H01L21/336;G02F1/1368;H01L29/786;H01L51/50;H05B33/02;H05B33/10;H05B33/14 主分类号 H01L21/336
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